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Chinese Physics C> 2015, Vol. 39> Issue(12) : 127007 DOI: 10.1088/1674-1137/39/12/127007

Deposition and characterization of TiZrV-Pd thin films by dc magnetron sputtering

  • 1.

     National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China

  • TiZrV film is mainly applied in the ultra-high vacuum pipes of storage rings. Thin film coatings of palladium, which are added onto the TiZrV film to increase the service life of nonevaporable getters and enhance H2 pumping speed, were deposited on the inner face of stainless steel pipes by dc magnetron sputtering using argon gas as the sputtering gas. The TiZrV-Pd film properties were investigated by atomic force microscope (AFM), scanning electron microscope (SEM), X-ray photoelectron spectroscopy (XPS) and X-Ray Diffraction (XRD). The grain size of TiZrV and Pd films were about 0.42-1.3 nm and 8.5-18.25 nm respectively. It was found that the roughness of TiZrV films is small, about 2-4 nm, but for Pd film it is large, about 17-19 nm. The PP At. % of Pd in TiZrV/Pd films varied from 86.84 to 87.56 according to the XPS test results.
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  • References

    [1] Benvenuti C, Chiggiato P, Mongelluzzo A, Prodromides A, Ruzinov V, Scheuerlein C, Taborelli M, Levy F. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2001, 19(6): 2925
    [2] Drbohlav J, Matolin V. Vacuum, 2003, 71(1-2): 323
    [3] Ferreira M J, Seraphim R M, Ramirez A J, Tabacniks M H, Nascente P A P. Physcs Proc., 2012, 32: 840
    [4] Sutara F, Skala T, Masek K, Matolin V. Vacuum, 2009, 83(5): 824
    [5] Pimpec F Le, Kirby R E, King F K, Pivi M. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 2006, 564(1): 44
    [6] Suetsugu Y, Kanazawa K, Shibata K, Hisamatsu H, Oide K, Takasaki F, Dostovalov R V, Krasnov A A, Zolotarev K V, Konstantinov E S, Chernov V A, Bondar A E, Shmakov A N. Accelerators, Spectrometers, Detectors and Associated Equipment, 2005, 554(1-3): 92
    [7] Pimpec F Le, Kirby R E, King F, Pivi M. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 2005, 551(2-3): 187
    [8] Anashin V V, Collins I R, Dostovalov R V, Fedorov N V, Krasnov A A, Malyshev O B, Ruzinov V L. Vacuum, 2004, 75(2): 155
    [9] Mahner E, Hansen J, Kühler D, Malabaila M, Taborelli M. Physical Review Special Topics-Accelerators and Beams, 2005, 8(5):
    [10] Drbohlav J, Matolinova I, Masek K, Matolin V. Vacuum, 2005, 80(1-3): 47
    [11] Mura M, Paolini C. Vakuum in Forschung und Praxis, 2007, 19(4): 13
    [12] Paolini C, Mura M, Ravelli F. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2008, 26(4): 1037
    [13] Benvenuti C, Chiggiato P, Cicoira F, Aminot Y L, Ruzinov V. Vacuum, 2004, 73(2): 139
    [14] WANG Yong et al. Proceedings of PAC09. Vancouver, BC, Canada. http//epaper.kek.jp/PAC2009/papers/mo6rfp024.pdf

  • References

    [1] Benvenuti C, Chiggiato P, Mongelluzzo A, Prodromides A, Ruzinov V, Scheuerlein C, Taborelli M, Levy F. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2001, 19(6): 2925
    [2] Drbohlav J, Matolin V. Vacuum, 2003, 71(1-2): 323
    [3] Ferreira M J, Seraphim R M, Ramirez A J, Tabacniks M H, Nascente P A P. Physcs Proc., 2012, 32: 840
    [4] Sutara F, Skala T, Masek K, Matolin V. Vacuum, 2009, 83(5): 824
    [5] Pimpec F Le, Kirby R E, King F K, Pivi M. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 2006, 564(1): 44
    [6] Suetsugu Y, Kanazawa K, Shibata K, Hisamatsu H, Oide K, Takasaki F, Dostovalov R V, Krasnov A A, Zolotarev K V, Konstantinov E S, Chernov V A, Bondar A E, Shmakov A N. Accelerators, Spectrometers, Detectors and Associated Equipment, 2005, 554(1-3): 92
    [7] Pimpec F Le, Kirby R E, King F, Pivi M. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 2005, 551(2-3): 187
    [8] Anashin V V, Collins I R, Dostovalov R V, Fedorov N V, Krasnov A A, Malyshev O B, Ruzinov V L. Vacuum, 2004, 75(2): 155
    [9] Mahner E, Hansen J, Kühler D, Malabaila M, Taborelli M. Physical Review Special Topics-Accelerators and Beams, 2005, 8(5):
    [10] Drbohlav J, Matolinova I, Masek K, Matolin V. Vacuum, 2005, 80(1-3): 47
    [11] Mura M, Paolini C. Vakuum in Forschung und Praxis, 2007, 19(4): 13
    [12] Paolini C, Mura M, Ravelli F. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2008, 26(4): 1037
    [13] Benvenuti C, Chiggiato P, Cicoira F, Aminot Y L, Ruzinov V. Vacuum, 2004, 73(2): 139
    [14] WANG Yong et al. Proceedings of PAC09. Vancouver, BC, Canada. http//epaper.kek.jp/PAC2009/papers/mo6rfp024.pdf

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Cited by

1. Xu, M., Feng, Y., Zhao, D. et al. Effects of substrate deposition on absorption properties and film stress of ZrCoRE getter films[J]. Journal of Alloys and Compounds, 2025. doi: 10.1016/j.jallcom.2025.182274
2. Zhou, C., Ma, Z., Li, G. et al. Effect of Magnetron Sputtered Gas on Microstructure and Hydrogen Adsorption Performance of ZrCoRE Films | [磁控溅射气体对 ZrCoRE 薄膜微观结构和吸氢性能的影响][J]. Xiyou Jinshu Cailiao Yu Gongcheng Rare Metal Materials and Engineering, 2025, 54(6): 1451-1456. doi: 10.12442/j.issn.1002-185X.20240265
3. Shi, Q., Wang, S., Ma, Y. et al. Unveiling the secrets of non-evaporable getter films: Activation temperature, activation time, and achievable activation degree[J]. Journal of Alloys and Compounds, 2024. doi: 10.1016/j.jallcom.2024.175771
4. Zhou, C., Li, D., Zhou, H. et al. Influence of the sputtering glancing angle on the microstructure and adsorption characteristics of Zr-Co-RE getter films[J]. Materials Research Express, 2020, 7(3): 036402. doi: 10.1088/2053-1591/ab7968
5. Ge, X.Q., Shao, J.Q., Wang, Y.G. et al. Comparison of TiZrV Non-Evaporable Getter Films Deposited by DC Magnetron Sputtering or Quantitative Deposition[J]. Journal of Physics Conference Series, 2019, 1350(1): 012173. doi: 10.1088/1742-6596/1350/1/012173
6. Wang, J., Zhang, B., Xu, Y.-H. et al. Research on deposition rate of TiZrV/Pd film by DC magnetron sputtering method[J]. Nuclear Science and Techniques, 2017, 28(4): 50. doi: 10.1007/s41365-017-0199-6
Get Citation
WANG Jie, ZHANG Bo, XU Yan-Hui, WEI Wei, FAN Le, PEI Xiang-Tao, HONG Yuan-Zhi and WANG Yong. Deposition and characterization of TiZrV-Pd thin films by dc magnetron sputtering[J]. Chinese Physics C, 2015, 39(12): 127007. doi: 10.1088/1674-1137/39/12/127007
WANG Jie, ZHANG Bo, XU Yan-Hui, WEI Wei, FAN Le, PEI Xiang-Tao, HONG Yuan-Zhi and WANG Yong. Deposition and characterization of TiZrV-Pd thin films by dc magnetron sputtering[J]. Chinese Physics C, 2015, 39(12): 127007.  doi: 10.1088/1674-1137/39/12/127007 shu
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Received: 2015-04-02
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    Supported by National Natural Science Funds of China (11205155) and Fundamental Research Funds for the Central Universities (WK2310000041)

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Deposition and characterization of TiZrV-Pd thin films by dc magnetron sputtering

    Corresponding author: ZHANG Bo,
  • 1. National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China
  • Received Date: 2015-04-02
  • Available Online: 2015-12-20
Fund Project:  Supported by National Natural Science Funds of China (11205155) and Fundamental Research Funds for the Central Universities (WK2310000041)

Abstract: TiZrV film is mainly applied in the ultra-high vacuum pipes of storage rings. Thin film coatings of palladium, which are added onto the TiZrV film to increase the service life of nonevaporable getters and enhance H2 pumping speed, were deposited on the inner face of stainless steel pipes by dc magnetron sputtering using argon gas as the sputtering gas. The TiZrV-Pd film properties were investigated by atomic force microscope (AFM), scanning electron microscope (SEM), X-ray photoelectron spectroscopy (XPS) and X-Ray Diffraction (XRD). The grain size of TiZrV and Pd films were about 0.42-1.3 nm and 8.5-18.25 nm respectively. It was found that the roughness of TiZrV films is small, about 2-4 nm, but for Pd film it is large, about 17-19 nm. The PP At. % of Pd in TiZrV/Pd films varied from 86.84 to 87.56 according to the XPS test results.

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