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Chinese Physics C> 2001, Vol. 25> Issue(S1) : 131-134 

Study on New Type LIGA Mask Fabrication Technique

  •  Institute of Micro/Nanometer Science & Technology,Shanghai Jiao Tong University,Shanghai 200030,China1 Institute of Microelectronics,Peking University,CAS,Beijing 100871,China2 Institute of High Energy Physics,CAS,Beijing 100039,China

  • The fabrication of LIGA masks is a critical and challenging process in LIGA technique.As inductively coupled plasma (ICP) deepetching appears to be the most suitable source for deep silicon etching,we fabricated a new type LIGA mask using this technique.In comparison with other types of LIGA masks,the mask we fabricated has the advantages of its low cost and its simple fabrication process.Desired microstructures have also been fabricated using this new type LIGA mask in LIGA mask in LIGA technique.
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    [1] Ehrfeld W, Lehr H. Radiat. Phys. Chem., 1995, 45(3):3492 Sheu J T, Chiang M H, SU S. Microsystem Technologies, 1998, 4:743 陈迪等.X光掩模板制造技术.中国专利.申请号:00111413.14 Klein J, Guckel H et al. Microsystem Technologies, 1998, 4:705 Bhardwaj J K, Ashraf H. Proceedings of SPIE, 1996, 2639:224

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CHEN Di, ZHU Jun, LEI Wei, WANG Sui, ZHANG Da-Cheng and YI Fu-Ting. Study on New Type LIGA Mask Fabrication Technique[J]. Chinese Physics C, 2001, 25(S1): 131-134.
CHEN Di, ZHU Jun, LEI Wei, WANG Sui, ZHANG Da-Cheng and YI Fu-Ting. Study on New Type LIGA Mask Fabrication Technique[J]. Chinese Physics C, 2001, 25(S1): 131-134. shu
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Received: 1900-01-01
Revised: 1900-01-01
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Study on New Type LIGA Mask Fabrication Technique

    Corresponding author: CHEN Di,
  • Institute of Micro/Nanometer Science & Technology,Shanghai Jiao Tong University,Shanghai 200030,China1 Institute of Microelectronics,Peking University,CAS,Beijing 100871,China2 Institute of High Energy Physics,CAS,Beijing 100039,China
  • Received Date: 1900-01-01
  • Accepted Date: 1900-01-01
  • Available Online: 2001-06-22

Abstract: The fabrication of LIGA masks is a critical and challenging process in LIGA technique.As inductively coupled plasma (ICP) deepetching appears to be the most suitable source for deep silicon etching,we fabricated a new type LIGA mask using this technique.In comparison with other types of LIGA masks,the mask we fabricated has the advantages of its low cost and its simple fabrication process.Desired microstructures have also been fabricated using this new type LIGA mask in LIGA mask in LIGA technique.

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