Study on New Type LIGA Mask Fabrication Technique

Get Citation
CHEN Di, ZHU Jun, LEI Wei, WANG Sui, ZHANG Da-Cheng and YI Fu-Ting. Study on New Type LIGA Mask Fabrication Technique[J]. Chinese Physics C, 2001, 25(S1): 131-134.
CHEN Di, ZHU Jun, LEI Wei, WANG Sui, ZHANG Da-Cheng and YI Fu-Ting. Study on New Type LIGA Mask Fabrication Technique[J]. Chinese Physics C, 2001, 25(S1): 131-134. shu
Milestone
Received: 1900-01-01
Revised: 1900-01-01
Article Metric

Article Views(2970)
PDF Downloads(510)
Cited by(0)
Policy on re-use
To reuse of subscription content published by CPC, the users need to request permission from CPC, unless the content was published under an Open Access license which automatically permits that type of reuse.
通讯作者: 陈斌, bchen63@163.com
  • 1. 

    沈阳化工大学材料科学与工程学院 沈阳 110142

  1. 本站搜索
  2. 百度学术搜索
  3. 万方数据库搜索
  4. CNKI搜索

Email This Article

Title:
Email:

Study on New Type LIGA Mask Fabrication Technique

    Corresponding author: CHEN Di,
  • Institute of Micro/Nanometer Science & Technology,Shanghai Jiao Tong University,Shanghai 200030,China1 Institute of Microelectronics,Peking University,CAS,Beijing 100871,China2 Institute of High Energy Physics,CAS,Beijing 100039,China

Abstract: The fabrication of LIGA masks is a critical and challenging process in LIGA technique.As inductively coupled plasma (ICP) deepetching appears to be the most suitable source for deep silicon etching,we fabricated a new type LIGA mask using this technique.In comparison with other types of LIGA masks,the mask we fabricated has the advantages of its low cost and its simple fabrication process.Desired microstructures have also been fabricated using this new type LIGA mask in LIGA mask in LIGA technique.

    HTML

Reference (1)

目录

/

DownLoad:  Full-Size Img  PowerPoint
Return
Return