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Chinese Physics C> 2001, Vol. 25> Issue(S1) : 128-130 

Study on Synchrotron Radiation Lithography at BSRF

  •  Institute of High Energy Physics,CAS,Beijing 100039,China

  • It is the excellence for fabricating microstructures with high aspect ratio and great structural height by synchrotron radiation lithography.A successive exposure method with present masks is put forward in this paper.Microstructures with thickness 2.2mm have been obtained by this method.A serial of studies of the effects on aspect ratio of mask,PMMA resist,substrate,wavelength range and dose of X rays have been processed.Microstructures with aspect ratio 104 have been obtained under optimized condition.
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    [1] Griffiths S K, Hruby J M, Ting T. J. Micromech.Microeng., 1999, 9:3532 Guckel H, Christenson T R, Klein J et al. Proc. 7th Int. Symp. On Microsystems, Intelligent Materials and Robots, 1996, p213 CHENG Y, Shew B Y, Lin C Y et al. J. Micromech. Microeng, 1999, 9:584 YI F, JIN M, TANG E et al. Microsystem Technologies, 1996, 3:75 PENG Liang-Qiang, YI Fu-Ting, ZHANG )u-Fang et al. Micro/Nano Science and Technology, 2000, 5:51 (in Chinese)(彭良强，伊福廷，张菊芳等.微米/纳米科学与技术, 2000,5:51)

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PENG Liang-Qiang, YI Fu-Ting, HAN Yong and ZHANG Ju-Fang. Study on Synchrotron Radiation Lithography at BSRF[J]. Chinese Physics C, 2001, 25(S1): 128-130.
PENG Liang-Qiang, YI Fu-Ting, HAN Yong and ZHANG Ju-Fang. Study on Synchrotron Radiation Lithography at BSRF[J]. Chinese Physics C, 2001, 25(S1): 128-130. shu
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Received: 1900-01-01
Revised: 1900-01-01
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Study on Synchrotron Radiation Lithography at BSRF

    Corresponding author: PENG Liang-Qiang,
  • Institute of High Energy Physics,CAS,Beijing 100039,China
  • Received Date: 1900-01-01
  • Accepted Date: 1900-01-01
  • Available Online: 2001-06-22

Abstract: It is the excellence for fabricating microstructures with high aspect ratio and great structural height by synchrotron radiation lithography.A successive exposure method with present masks is put forward in this paper.Microstructures with thickness 2.2mm have been obtained by this method.A serial of studies of the effects on aspect ratio of mask,PMMA resist,substrate,wavelength range and dose of X rays have been processed.Microstructures with aspect ratio 104 have been obtained under optimized condition.

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