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Chinese Physics C> 2005, Vol. 29> Issue(S1) : 40-42 

Phase Depth Profile in NiTi Shape Memory Alloy Films Made up from Sputter-Deposited Ni/Ti Multilayers

  •  Institute of Physical Science and Technology,Lanzhou University,Lanzhou 730000,China2 Institute of High Energy Physics,CAS,Beijing 100049,China

  • Phase depth profile in NiTi shape memory alloy films made up from sputter-deposited Ni/Ti multilayers is studied by Grazing-Incidence X-Ray Diffraction. Phase depth profile is not uniform in NiTi films. Both samples show there is a multiphase mixture region of Ti3Ni4 precipitates, martensite and a little of austenite near the free surface and a uniform Martensite phase near the substrate. Diffusion and reaction take place between film and substrate. Different periodical thickness will affect the phase depth profile in the after-annealing films.
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    [1] . LAI Bo-Kuai, PhD thesis, 2004, UMI number: 31181382. Busch J D et al. J. Appl. Phys., 1990, 68(12): 62243. Walker J A et al. Sens. Actuators, 1990, A21—A23: 2434. Lehnert T et al. Mater. Sci. Eng., 1999, A273: 7135. Ohta A et al. Sensors and Actuators, 2000, 86: 1656. Lehnert T et al. Acta Mater., 2000, 48: 4065

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WEI Xiang-Jun, XU Qing, JIA Quan-Jie and WANG Huan-Hua. Phase Depth Profile in NiTi Shape Memory Alloy Films Made up from Sputter-Deposited Ni/Ti Multilayers[J]. Chinese Physics C, 2005, 29(S1): 40-42.
WEI Xiang-Jun, XU Qing, JIA Quan-Jie and WANG Huan-Hua. Phase Depth Profile in NiTi Shape Memory Alloy Films Made up from Sputter-Deposited Ni/Ti Multilayers[J]. Chinese Physics C, 2005, 29(S1): 40-42. shu
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Received: 2005-10-28
Revised: 1900-01-01
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Phase Depth Profile in NiTi Shape Memory Alloy Films Made up from Sputter-Deposited Ni/Ti Multilayers

    Corresponding author: WEI Xiang-Jun,
  • Institute of Physical Science and Technology,Lanzhou University,Lanzhou 730000,China2 Institute of High Energy Physics,CAS,Beijing 100049,China
  • Received Date: 2005-10-28
  • Accepted Date: 1900-01-01
  • Available Online: 2005-01-02

Abstract: Phase depth profile in NiTi shape memory alloy films made up from sputter-deposited Ni/Ti multilayers is studied by Grazing-Incidence X-Ray Diffraction. Phase depth profile is not uniform in NiTi films. Both samples show there is a multiphase mixture region of Ti3Ni4 precipitates, martensite and a little of austenite near the free surface and a uniform Martensite phase near the substrate. Diffusion and reaction take place between film and substrate. Different periodical thickness will affect the phase depth profile in the after-annealing films.

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