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                                 Abstract:The article describes a small-size are discharge ion source. Some of its basic parameters are measured by combining the are discharge with the electron oscillation. The ion current is 7mA. It can produce multi-charge ions. The extraction structure is commonly used by this source and the r.f. ion source. This ion source has been used in a 400keV ion implanter in Beijing Normal University and it is stable in operation.
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                        References
	
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